New advances in resist system for next generation lithography
Chemistry Department, University of North Carolina Charlotte,
Charlotte, NC 28223 USA
This is an abstract
for a presentation given at the
Foresight Conference on Molecular Nanotechnology.
There will be a link from here to the full article when it is
available on the web.
A novel nanocomposite resist system was developed for sub-100 nm resolution e-beam lithography by dispersing surface-treated silica nanoparticles in a commercial ZEP520® resist. At 4.0 wt % loading of silica nanoparticles, the system exhibited a much higher resolution than ZEP520® without sacrificing the intrinsic sensitivity and contrast of the starting polymer.
The first major result is that 46 nm-wide isolated lines were obtained in the nanocomposite system (~ 250 nm thick layer), whereas comparatively 130 nm-wide lines were obtained in ZEP520® under the same experimental conditions. Interestingly, this dramatic reduction of line broadening already occurred at 20 keV while higher energy e-beams (up to 100 keV) did not lead to further line broadening reduction. Moreover, it was shown that the addition of silica nanoparticles resulted in a higher resistance of the nanocomposite to plasma etching with O2 gas.
Subjecting the nanocomposite resist to 75 keV Xe+ ion irradiation showed that it is also particularly suitable for ion projection lithography as a preliminary resolution of 114 nm (l/s) was obtained while the sensitivity increased by a factor of 40 compared to 30 keV electrons. The major resolution improvement in this system indicates that nanocomposite systems are promising candidates for sub-100 nm resolution e-beam lithography. A mechanism, explaining the electron-nanocomposite interactions at the origin of line broadening reduction, is proposed and tentatively backed by preliminary Monte Carlo simulations.
We acknowledge the help of L. Merhari, CERAMEC R&D Limoges France and W.H. Bruenger, Fraunhofer Inst. For Silicon Technology (IsiT), Itzehoe, Germany
Abstract in RTF format 4,247 bytes
Chemistry Department, University of North Carolina Charlotte
9201 University City Blvd., Charlotte, NC 28223 USA
Phone: 704 687 3064
Fax: 704 687 3151